NYC 2018 Workshop

It’s been some time since I last sat down to write about photography. Since then, Sam and I have traveled to London, Paris, and most recently Brooklyn where I met up with Johnny and Rebecca Patience for their NYC 2018 workshop at the Bushwick Community Darkroom. As for London and Paris, more to come once I’ve finished my selections and edits.

Johnny’s NYC workshop was centered around the goals of better understanding black and white film photography - more specifically, the relationship between exposures and density of negatives along with the importance of your workflow and approach in the darkroom. 

We spent the first day discussing your approach, philosophies behind metering, and spending some time taking photos throughout Bushwick. The second day was spent entirely in the darkroom where we reviewed our negatives, made selections, experimented with the enlarger, ran test strips, and finally narrowed in on our development times for our desired look and feel.

Having shot film for nearly four years now, it’s embarrassing to write that this was the first time I’ve stepped foot in a darkroom. I’ve always collaborated with Richard Photo Lab when it came to my film work including development, scanning, and fine art prints. And, while it sounds cliché, there really is a different feeling when developing your own work. It’s an art in and of itself and left me feeling both incredibly humbled yet inspired.

Needless to say, you can only begin to scratch the surface in a two day workshop, however I left New York City with a new appreciation for both B&W photography and the darkroom. And, the role that it can play in shaping my approach and my work.

All photographs were created with a Leica M6 and the Leica Summicron-M 50mm f/2 on Kodak Tri-X 400.

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